Interferometric lithography with an amplitude division interferometer and a desktop extreme ultraviolet laser
نویسندگان
چکیده
P. Wachulak, M. Grisham, S. Heinbuch, D. Martz, W. Rockward, D. Hill, J. J. Rocca, C. S. Menoni, E. Anderson, and M. Marconi* National Science Foundation Engineering Research Center for Extreme Ultraviolet Science & Technology, Colorado State University, 1373 Campus Delivery, Fort Collins, Colorado 80523, USA Department of Electrical and Computer Engineering, Colorado State University, 1373 Campus Delivery, Fort Collins, Colorado 80523, USA Morehouse College, 830 Westview Drive, SW, Atlanta, Georgia 30314, USA Center for X Ray Optics, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, USA *Corresponding author: [email protected]
منابع مشابه
Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography.
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